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发明名称
VERFAHREN ZUM ENTSCHICHTEN VON LICHTGEHAERTETEN PHOTORESISTSCHICHTEN
摘要
申请公布号
DE3530282(A1)
申请公布日期
1987.03.05
申请号
DE19853530282
申请日期
1985.08.24
申请人
HOECHST AG
发明人
STEPPAN,HARTMUT,DIPL.-CHEM.DR.;GEISSLER,ULRICH,DIPL.-CHEM.DR.
分类号
G03D3/06;G03F7/42;(IPC1-7):G03F7/00;B05D3/10
主分类号
G03D3/06
代理机构
代理人
主权项
地址
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