发明名称 |
Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure. |
摘要 |
<p>A process for manufacturing a mask for use in x-ray photolithography begins with a step of providing a glass disk (50) which is coated with a layer of boron nitride (52). The glass disk is about ¼ of an inch thick and about 4.5 to 6 inches in diameter. A circular portion (50a) of the boron nitride layer on one side of the glass disk is removed thus exposing a circular portion of the glass disk. The exposed portion of the glass disk is then removed, leaving a glass ring coated with a boron nitride membrane on one side. A layer of polyimide (54) and a layer of x-ray opaque substance (58) is deposited on the boron nitride membrane. The x-ray opaque que substance is then patterned, the resulting structure being a mask which is used in x-ray photolithography.</p> |
申请公布号 |
EP0212713(A2) |
申请公布日期 |
1987.03.04 |
申请号 |
EP19860201289 |
申请日期 |
1986.07.22 |
申请人 |
MICRONIX CORPORATION |
发明人 |
SHIMKUNAS, ALEXANDER R.;LABRIE, JAMES J. |
分类号 |
G03F1/22;H01L21/027;(IPC1-7):G03F1/00 |
主分类号 |
G03F1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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