发明名称 PHOTOSENSITIVE COMPOSITION CONTAINING TRIPHENYLIMIDAZOLE DIMER
摘要 PURPOSE:To increase the sensitively by using an specified triphenylimidazole dimer as a photooxidizing agent. CONSTITUTION:When a photosensitive composition is composed of a fixing layer consisting of a fixing agent and a binder, and a color developing layer consisting of an oxidizable leucotriarylmethane dye as a coupler, a photooxidizing agent, an auxiliary coupler and a binder, a 2,4,5- triphenylimidazole dimer represented by formula I is used as the photooxidizing agent. The resulting photosensitive composition is suitable for use as a material for a PS plate, a material for preventing the lap exposure of a photoresist or confirming the position of a photomask or a material for proof. The fixing layer can properly be selected according to the purpose for which the photosensitive composition is used. An intermediate layer made of a resin film may be interposed between the fixing layer and the photosensitive layer as required. A strong acid or polyether is effective as the auxiliary coupler.
申请公布号 JPS6249345(A) 申请公布日期 1987.03.04
申请号 JP19850188618 申请日期 1985.08.29
申请人 HODOGAYA CHEM CO LTD 发明人 SENSUI HIDEYUKI;ICHIKAWA JUNJI;SATO SHINICHI
分类号 C07D405/14;C07D233/64;C07D317/00;G03C1/675 主分类号 C07D405/14
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