发明名称 Micro replication process.
摘要 <p>A method of replicating a master pattern comprising coating the master pattern with a layer of a radiation curable composition comprising as the radiation curable component, a compound having the structure &lt;CHEM&gt; wherein R represents a cycloaliphatic or an aromatic group; R1 represents -(CH2)-n; CH2CH2OCH2CH2- or &lt;CHEM&gt; R2 represents hydrogen or methyl; n is 2 to 10; p is 3 or 4; and exposing the layer to actinic radiation thereby forming a negative image of the master pattern in the layer.</p>
申请公布号 EP0212271(A2) 申请公布日期 1987.03.04
申请号 EP19860109839 申请日期 1986.07.17
申请人 EASTMAN KODAK COMPANY (A NEW JERSEY CORPORATION) 发明人 KAPLAN, MARK STEVEN;MOLAIRE, MICHEL FRANTZ
分类号 G03F7/004;G11B7/26 主分类号 G03F7/004
代理机构 代理人
主权项
地址
您可能感兴趣的专利