发明名称 |
Micro replication process. |
摘要 |
<p>A method of replicating a master pattern comprising coating the master pattern with a layer of a radiation curable composition comprising as the radiation curable component, a compound having the structure <CHEM> wherein R represents a cycloaliphatic or an aromatic group; R1 represents -(CH2)-n; CH2CH2OCH2CH2- or <CHEM> R2 represents hydrogen or methyl; n is 2 to 10; p is 3 or 4; and exposing the layer to actinic radiation thereby forming a negative image of the master pattern in the layer.</p> |
申请公布号 |
EP0212271(A2) |
申请公布日期 |
1987.03.04 |
申请号 |
EP19860109839 |
申请日期 |
1986.07.17 |
申请人 |
EASTMAN KODAK COMPANY (A NEW JERSEY CORPORATION) |
发明人 |
KAPLAN, MARK STEVEN;MOLAIRE, MICHEL FRANTZ |
分类号 |
G03F7/004;G11B7/26 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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