Process for depositing a silica coating with an irregular surface on a glass substrate.

摘要

The invention proposes to inject gaseous reactants in the direction of the heated substrate at flow rates and in proportions such that a partial reaction resulting in the formation of silica particles takes place before the meeting with the substrate, these silica particles becoming embedded in the layer which forms on the substrate with the remaining reactants. This results in an irregularly-surfaced coating layer which can be employed especially in solar cells. <IMAGE>