发明名称 DEVELOPING SOLUTION FOR PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To enhance developing power, developing stability, processing performance, and foam suppression property of the developing soln. for use in a lithographic plate having an o-quinonediazide photosensitive layer by incorporating a specified water-soluble diamine comd. in an aq. soln. of alkali silicate in a specified ratio. CONSTITUTION:A printing plate superior in dot reproducibility can be obtained by using as the developing soln. of a photosensitive lithographic plate having an o-quinonediazide photosensitive layer a soln. prepared by incorporating in an aq. soln. of alkali silicate, in an amt. of 0.001-10wt%, a water-soluble compd. represented by the formula in which each of R1-R8 may be same or different, and each is H or CH3; each of R9-R12 may be same or different, and each is H, CH3, COR13, or CONHR14, and each of R13, R14 is alkyl, aryl, alkenyl, or alkynyl; a is 2-12; each of b, c, d, e, f, g, h, and i may be same or different, and each is 0-300, and each of (b+f), (c+g), (d+h), and (e+i) is not 0.
申请公布号 JPS60129750(A) 申请公布日期 1985.07.11
申请号 JP19830237701 申请日期 1983.12.16
申请人 FUJI SHASHIN FILM KK 发明人 MATSUMOTO HIROSHI;HAGIWARA HITOSHI
分类号 G03F7/00;G03F7/022;G03F7/32;(IPC1-7):G03F7/08 主分类号 G03F7/00
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