| 摘要 |
PURPOSE:To realize a structure capable of obtaining a merit due to orientation without generating the release caused by strain due to heat expansion difference, by partially arranging dielectric membranes between membrane electrodes and pyroelectric membrane formed on a substrate. CONSTITUTION:A dielectric membrane 3 is formed on the first membrane electrodes 2 formed on a substrate 1 by sputtering. Further, these membranes 3 are formed by a photolithography technique. Next, pyroelectric membranes 4 are formed on the electrodes 2 or the dielectric membranes 3 by sputtering. Each pyroelectric membrane 4 consists of the highly oriented part 41 grown on each electrode 2 and the unoriented part 42 grown on each dielectric membrane 3. A plurality of a second membrane electrodes 5 are formed on the oriented part 41 of each pyroelectric membrane 4 in a line form as vapor deposition membranes. The substrate 1 is removed at the lower part 6 of the electrodes 5 by etching. By this method, the internal strain generated in a manufacturing process cooling manufacturing temp. to room temp. is lowered and the destruction/release of the pyroelectric membranes is prevented and membrane strength is enhanced. |
