| 摘要 |
<p>For scrubbing C2+ or C3+ hydrocarbons from gaseous mixture containing hydrocarbons and/or inerts like H2, N2, CO and possibly acid gases, e.g. CO2H2S, COS e.g., natural gas and the like, the scrubbing medium consists essentially of compounds having one to two rings formed by 5 or 6 carbon atoms, wherein the compounds comprise, in total, at least 9 and at most 17 carbon atoms, and the rings are saturated unsaturated or partially saturated especially alkylated ring compounds of 9 or 10 carbon atoms, e.g. isomeric forms of trimethylbenzene, propylbenzene, propylcyclohexane, tetrahydronaphthalene, decahydronaphthalene.</p> |
