| 摘要 |
PURPOSE:To enable back scatter analysis and detection of the crystalline bearing of a microcrystalline region by irradiating a focused ion beam upon a given point on the sample with varying angle and detecting resulting secondary particles and secondary recoil ions. CONSTITUTION:A focused ion beam 22 from a focused ion beam radiator including an ion source 3 is deflected and focused and then is irradiated upon a given point on a sample 18 with varying angle. Resulting secondary particles 23 consisting of secondary electrons and recoil ions of a primary beam are detected by a detector 17. After the output of the detector 17 is delivered to an energy discriminator 19, the variation in the incidence angle is corrected by an ion- beam-incidence-angle-correcting circuit 20 and analyzed by a computer 21. Due to the above structure, back scatter analysis of the microcrystalline region is enabled without moving the sample by increasing the amount of information. Besides, it is possible to easily detect the crystalline bearing. |
