发明名称 |
Multi-component buffer gas mixture for XeF(C->A) laser |
摘要 |
A xenon fluoride (C->A) laser operating in the visible region is improved by the use of a synthesized buffer gas containing at least two components that combine to provide kinetic properties that are different from those of any single-component buffer gas.
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申请公布号 |
US4646311(A) |
申请公布日期 |
1987.02.24 |
申请号 |
US19850726530 |
申请日期 |
1985.04.24 |
申请人 |
UNITED TECHNOLOGIES CORPORATION |
发明人 |
NIGHAN, WILLIAM L.;TITTEL, FRANK K.;WILSON, JR., WILLIAM L. |
分类号 |
H01S3/225;(IPC1-7):H01S3/22 |
主分类号 |
H01S3/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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