发明名称 Multi-component buffer gas mixture for XeF(C->A) laser
摘要 A xenon fluoride (C->A) laser operating in the visible region is improved by the use of a synthesized buffer gas containing at least two components that combine to provide kinetic properties that are different from those of any single-component buffer gas.
申请公布号 US4646311(A) 申请公布日期 1987.02.24
申请号 US19850726530 申请日期 1985.04.24
申请人 UNITED TECHNOLOGIES CORPORATION 发明人 NIGHAN, WILLIAM L.;TITTEL, FRANK K.;WILSON, JR., WILLIAM L.
分类号 H01S3/225;(IPC1-7):H01S3/22 主分类号 H01S3/225
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