| 摘要 |
<p>PURPOSE:To prevent the blurring of the end section of a resist pattern by laminating and forming mask patterns having the same shape consisting of an X-ray absorbent. CONSTITUTION:A layer 3 composed of a compound such as boron nitride and a film 4 consisting of polyimide, etc. are shaped onto a mask base material 2 such as an silicon wafer. First mask patterns 7 consisting of thin-layers in gold, etc. and a coating layer 8 composed of an X0ray transmitting material such as polyimide coating the patterns 7 are formed onto the film 4. Second mask patterns 9 consisting of thin-layers in gold, etc. formed to the same shape as the patterns 7 and a coating layer 10 composed of the same material as the layer 8 are formed onto the layer 8. According to the constitution, the end sections of the patterns 7, 9 are shaped vertically because of the thin patterns 7, 9, thus resulting in no blurring of the end sections of the resist patterns.</p> |
