| 摘要 |
PURPOSE:To obtain a photosensitive body superior in electrostatic chargeability, sensitivity, and resistance to ambient conditions, low in residual potential, and good in adhesion by laminating on a conductive substrate an a-Si barrier layer, a photoconductive layer specified in thickness composed of a upsilonC Si layer and an a-Si layer each specified in thickness, and a surface layer, and incorporating specified elements in these layers. CONSTITUTION:A drum substrate 4 is set in a reactor 9, and evacuated through a gate valve 19. The drum 14 is heated with a heater 15 while it is rotated, and a gas mixture of SiH4, B2H6, N2, etc., in a specified proportion is introduced from cylinders 1-5. Plasma is caused between an electrode 13 and the drum 14, and the a-Si barrier layer 22 is formed on the drum substrate 14(21), and then, the photoconductive layer 31 composed of the muC Si layer 23 and the a-Si layer 24 and the a-Si surface layer 25 are formed by changing the composi tion of the gas mixture and the plasma discharge conditions. At least one of elements of groups III and V, and C, N, and O is incorporated in the layers 22, 23, and 24 and each leyer thickness is regulated to 5, 50, and 0.01-15mum, respectively. |
