发明名称 PROCESS FOR PREPARATION OF SELECTIVE LIGHT ABSORPTIVE METHACRYLIC RESINS
摘要 A methacrylic resin capable of selectively absorbing light rays having a wavelength of 580 nm is advantageously produced either by dispersing or dissolving neodymium compound in a resin-forming starting material selected from monomeric methyl methacrylate, a monomer mixture composed mainly of methyl methacrylate and partially polymerized products thereof, and polymerizing the resin-forming starting material. A solvent capable of dissolving therein the resin-forming starting material and the neodymium compound may be incorporated in the resin-forming starting material.
申请公布号 DE3369147(D1) 申请公布日期 1987.02.19
申请号 DE19833369147 申请日期 1983.06.21
申请人 MITSUBISHI RAYON CO. LTD. 发明人 IDA, KOZO
分类号 C08F2/44;C08F20/14;C08F265/06;(IPC1-7):C08F20/14 主分类号 C08F2/44
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