发明名称 |
PROCESS FOR PREPARATION OF SELECTIVE LIGHT ABSORPTIVE METHACRYLIC RESINS |
摘要 |
A methacrylic resin capable of selectively absorbing light rays having a wavelength of 580 nm is advantageously produced either by dispersing or dissolving neodymium compound in a resin-forming starting material selected from monomeric methyl methacrylate, a monomer mixture composed mainly of methyl methacrylate and partially polymerized products thereof, and polymerizing the resin-forming starting material. A solvent capable of dissolving therein the resin-forming starting material and the neodymium compound may be incorporated in the resin-forming starting material. |
申请公布号 |
DE3369147(D1) |
申请公布日期 |
1987.02.19 |
申请号 |
DE19833369147 |
申请日期 |
1983.06.21 |
申请人 |
MITSUBISHI RAYON CO. LTD. |
发明人 |
IDA, KOZO |
分类号 |
C08F2/44;C08F20/14;C08F265/06;(IPC1-7):C08F20/14 |
主分类号 |
C08F2/44 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|