| 摘要 |
PURPOSE:To obtain the titled composition having a high photosensitivity and an excellent developing allowability by incorporating a compd. having a specific structural unit and a property of increasing a solubility in a developer with an irradiation of an active ray to the titled composition. CONSTITUTION:The titled composition comprises the compd. composed of the structural unit coming from a monomer having a polymerizable ethylenic unsatd. bond and contg. a silylester group and the structural unit coming from a monomer having the polymerizable ethylenic unsatd. bond and having a group capable of generating an acid with the irradiation of the active ray and having the property of increasing the solubility in the developer. The compounding ratio of the structural unit coming from the monomer having the silylester and the structural unit coming from the monomer having the group capable of generating the acid with the irradiation of the active ray is (1:0.0002)-(1:10) in the molar ratio. Thus, the composition having the high photosensitivity and the broad developing allowability in the development is obtd. |
