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发明名称
EVAPORATED SOLID SOURCE FOR ION IMPLANTING APPARATUS
摘要
申请公布号
JPS6237855(A)
申请公布日期
1987.02.18
申请号
JP19850177348
申请日期
1985.08.12
申请人
NEC KYUSHU LTD
发明人
MATSUYAMA TOSHIO
分类号
H01L21/265;H01J27/02;H01J37/08
主分类号
H01L21/265
代理机构
代理人
主权项
地址
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