| 摘要 |
PURPOSE:To provide a polytungstic acid which has peroxo structure and is advantageous for applications such as an inorg. resist material for manufacturing an electrochromic display element, integrated circuit, semiconductor, etc., and a catalyst for chemical reaction by dissolving a tungsten metal into an aq. hydrogen peroxide soln. CONSTITUTION:This polytungstic acid has the peroxo (O2<2->) structure. The above-mentioned polytungstic acid is the compd. expressed by the general formula: WO3.xH2O2.yH2O (x is 0.4-0.7; y is 3-4). The above-mentioned polytungstic acid is obtd. by dissolving the tungsten metal into the aq. hydrogen peroxide soln. and evaporating the resulted yellow aq. soln. to dryness at a room temp. The tungsten metal is preferably in powder state. |
