发明名称 UN PROCESO DE DEPOSICION DE FASE DE VAPOR MEJORADO
摘要 <p>In an inside tube vapor phase deposition process for the production of doped silica glass by an oxidation reaction for optical fibre manufacture, in particular fluorine doped silica, the oxidation reaction is prevented from occurring until the reactant material, for example silicon tetrachloride and a fluorinating reagent, has been heated to a temperature above that required for the oxidation reaction. This preheating of the reactant material results in the oxidation reaction producing compositions of glasses which are not allowed from thermodynamic considerations at the lower temperature usually employed for the oxidation reaction, for example silica more highly doped with fluorine than hitherto achieved.</p>
申请公布号 ES545474(D0) 申请公布日期 1987.02.16
申请号 ES19740005454 申请日期 1985.07.23
申请人 STANDARD ELECTRICA,S.A. 发明人
分类号 C03B8/04;C03B37/018;G02B6/00;(IPC1-7):C03C13/04 主分类号 C03B8/04
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