| 摘要 |
<p>The system is intended for coating a substrate with the aid of an arc discharge. It comprises a vacuum chamber containing a plasma source formed by an anode adjacent a target (cathode) of coating material, a substrate carrier, a filter or ion flow directing means between source and carrier, and means to maintain vacuum and to maintain potential differentials between target, anode, filter etc., and carrier. The filter consists of a barrier which contains openings and is arranged such that the direct line of sight from source to carrier is at least partly obscured. A grid downstream of the barrier is held at a negative and the barrier at a positive potential relative to the source.</p> |
