POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PURPOSE:To form a positive type photoresist composition high in dimensional precision for forming a micropattern by using a mixture of m-cresol and p-cresol in a specified mixing ratio, and a specified proportion of a photosensitizer to the novolak resin. CONSTITUTION:The positive type photoresist composition is composed essentially of 100pts.wt. of the cresol novolak resin A and 25-60pts.wt. of the photosensitizer containing naphthoquinonodiazidosulfonate B as a main component. The cresol novolak resin is composed of the cresol novolak resin obtained from 10-45wt% m-cresol, and 90-55wt% p-cresol. Any composition capable of satisfying both of the photoresist sensitivity and the sectional form of a pattern to be formed cannot be obtained from cresol novolak resins deviated from said ranges of the cresol isomers.