发明名称 |
PHASE SHIFT MASK AND THE MANUFACTURING METHOD THEREOF HAVING CHROME FILM |
摘要 |
a transparent substrate where light propagates; multiple phase inversion material pattern which have a predetermined shape and is fabricated on the transparent substrate; a chrome film fabricated on the phase inversion material pattern above the predetermined size. And the method includes the step of: fabricating a phase inversion pattern on a quartz substrate; fabricating the first sensitive film pattern; fabricating the first chrome pattern by eliminating the first sensitive film pattern; fabricating the sensitive film pattern; baking the second sensitive film pattern; fabricating the third sensitive film pattern; fabricating spacer oxide film on the wall of the second sensitive film pattern; fabricating the second chrome film.
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申请公布号 |
KR960000183(B1) |
申请公布日期 |
1996.01.03 |
申请号 |
KR19930012959 |
申请日期 |
1993.07.09 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD. |
发明人 |
HAM, YOUNG - MOK |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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