发明名称 PHASE SHIFT MASK AND THE MANUFACTURING METHOD THEREOF HAVING CHROME FILM
摘要 a transparent substrate where light propagates; multiple phase inversion material pattern which have a predetermined shape and is fabricated on the transparent substrate; a chrome film fabricated on the phase inversion material pattern above the predetermined size. And the method includes the step of: fabricating a phase inversion pattern on a quartz substrate; fabricating the first sensitive film pattern; fabricating the first chrome pattern by eliminating the first sensitive film pattern; fabricating the sensitive film pattern; baking the second sensitive film pattern; fabricating the third sensitive film pattern; fabricating spacer oxide film on the wall of the second sensitive film pattern; fabricating the second chrome film.
申请公布号 KR960000183(B1) 申请公布日期 1996.01.03
申请号 KR19930012959 申请日期 1993.07.09
申请人 HYUNDAI ELECTRONICS IND. CO., LTD. 发明人 HAM, YOUNG - MOK
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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