发明名称 |
MANUFACTURING METHOD OF PHASE SHIFT MASK |
摘要 |
passivating a light propagation suppressing material on the quartz substrate; eliminating the parts of prescribed width of the suppressing material after passivating a sensitive film on top of the suppressing material; passivating a phase inversion material on top of whole body; etching the prescribed parts after formulating a sensitive film again.
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申请公布号 |
KR960000178(B1) |
申请公布日期 |
1996.01.03 |
申请号 |
KR19930010710 |
申请日期 |
1993.06.12 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD. |
发明人 |
HAM, YOUNG - MOK |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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