| 摘要 |
PURPOSE:To prevent the distortion of a mask substrate, which is caused by opening a through-hole in the mask substrate, from being dispersed to the outside of a through-hole supporting frame to eliminate the distortion of a mask pattern by providing the through-hole supporting frame, which is stuck to the mask substrate and has rigidity, around the through-hole opened in the mask substrate. CONSTITUTION:A mask substrate 2 having a mask pattern which consists of materials absorbing the irradiation energy, a through-hole supporting frame 8, and a mask supporting frame 1 are stuck to one another. That is, since the through-hole supporting frame 8 is stuck around a through hole 6, the distortion of the mask substrate 2 which is caused by opening the through-hole 6 is not dispersed to the outside of the through hole supporting frame 8 having rigidity, and there is not a probability that the mask pattern 9 is distorted. If the mask supporting frame 1 and the through-hole supporting frame 8 are formed with the same materials as one body, thermal distortion is not different from that of a conventional mask at all because they are equal in coefficient of expansion. |
