发明名称 ELECTROSTATIC BREAKDOWN PROTECTING CIRCUIT OF MOS DEVICE
摘要 PURPOSE:To prevent the electrostatic breakdown of a gate oxide film, by a constitution wherein the gate length of an MOS transistor for driving the gate of an MOS transistor is made longer than the gate length of a driven MOS transistor, and the driven MOS transistor breaks down earlier than the MOS transistor for driving. CONSTITUTION:The gate length of each of MOS transistors 15 and 16 is made longer than the gate length of each of MOS transistors 3 and 4. Therefore the breakdown voltage of the MOS transistors 15 and 16 becomes high. When a switch 12 is turned ON, a switch 13 is turned ON earlier than a switch 17. Therefore, both voltages Va and Vb are decreased. Thereafter the value of the voltage difference Va-Vb does not become large. Since an excessive voltage is not applied to a capacitor 9, i.e., a part between the gates and the drains of the MOS transistors 3 and 4, the breakdown of the gate oxide film is prevented.
申请公布号 JPS6232654(A) 申请公布日期 1987.02.12
申请号 JP19850172635 申请日期 1985.08.05
申请人 MITSUBISHI ELECTRIC CORP 发明人 ITOBAYASHI MANABU
分类号 H01L29/78;H01L27/02;H01L27/06;H03F1/42;H03F1/52 主分类号 H01L29/78
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