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发明名称
METHOD OF BORON SELECTIVE IMPLANTATION INTO INSULATION REGIONS OF SEMICONDUCTOR SUBSTRATES
摘要
申请公布号
CS248236(B1)
申请公布日期
1987.02.12
申请号
CS19850005152
申请日期
1985.07.10
申请人
HOKKY,KAROL,CS;KONA,MARIAN,CS;MANCEL,MILAN,CS
发明人
HOKKY,KAROL,CS;KONA,MARIAN,CS;MANCEL,MILAN,CS
分类号
H01L21/02;(IPC1-7):H01L21/02
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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