| 摘要 |
An exposure system for imagewise exposure of a movable light-sensitive layer, dot by dot along a line on the layer, to an electronically modulated light beam such as that of a laser has a narrow slit disposed near the light-sensitive layer in the path of the light beam, the slit being made with a width less than the dimension at the slit of the light beam in the direction of slit width. In this simple way, the laser beam always describes at least one and the same imaging line relative to the light-sensitive layer, even when beam run-out occurs.
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