PHOTOCHEMICAL REACTION DEVICE

摘要

PURPOSE:To deposit a uniform thin film having high quality at a high speed by segmenting a plasma emission region and reaction region by a conductive shielding net and forming the film by a suitable combination of a gas for radiating UV rays and photochemical reactive gas. CONSTITUTION:The space in the upper part in a vessel 5 is the plasma emission region A and the lower space is the reaction region B. A pair of electrodes 1, 1 are disposed to face each other in the plasma emission region A and an introducing hole 9 for the gas G1 for radiating UV rays is formed to the ceiling part. Plasma P is thus formed between the electrodes 1 and 1 and the light including the UV rays released from the plasma P is irradiated to the reaction region B below the same. A substrate holder 3 is disposed in the reaction region B and a substrate 4 to be formed with the film is imposed thereon. The plasma emission region A and the reaction region B are segmented by the conductive shielding net 11.