PHOTOCHEMICAL REACTION DEVICE

摘要

PURPOSE:To deposit a uniform thin film having high quality at a high speed by disposing a shielding enclosure having a net-like conductive material or partly having the net-like conductive material to a plasma emission region and generating plasma in this enclosure to electrically separate a substrate and the plasma. CONSTITUTION:A photochemical reaction device has the plasma emission region A formed by gas discharge and a reaction region B where the substrate 4 to be formed with the film is disposed and a mechanism for releasing a photochemical reactive gas G2 is disposed within one vessel 5. The shielding enclosure 12 having the net-like conductive material or partly having the net-like conductive material is disposed in the plasma emission region A. The plasma P is generated in said shielding enclosure 12 to electrically separate the plasma P from the substrate 4.