发明名称 Process of producing galvanic layers of solder of precise contour on inorganic substrates
摘要 Very fine solder-coated conduction paths are made on ceramic, glass or enamel substrates by the combination of a first step in thick-film technology followed by the photo-masking and etching steps typical of thin-film technology, after which galvanic reinforcement of the initial calcined copper paste layer is performed in the locations where the initial layer is exposed by the developed mask. A lead-tin solder layer is then galvanically deposited, which is thicker than the mask, after which the mask is removed and the newly exposed portions of the initial copper layer are etched away. A reflow treatment of the solder layer pattern consolidates the solder layer by melting on top of the boundaries of the unetched initial copper layer. It is possible to obtain conduction path spacings down to 50 mu m with conduction paths coated with solder that have excellent adhesion to ceramic, glass or enamel substrates.
申请公布号 US4640739(A) 申请公布日期 1987.02.03
申请号 US19850765815 申请日期 1985.08.15
申请人 ROBERT BOSCH GMBH 发明人 MODIC, FEDOR;LEIBFRIED, WOLFGANG;NITSCH, MANFRED;SPITZENBERGER, KURT;ZIMMERMANN, HERBERT
分类号 C25D5/54;H05K1/03;H05K1/09;H05K3/06;H05K3/10;H05K3/24;H05K3/34;(IPC1-7):C23F1/02;C25D5/02;B44C1/22 主分类号 C25D5/54
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