| 发明名称 |
Modified phenolic resin composition |
| 摘要 |
The present invention provides a resinous composition of modified phenolic compounds comprising a phenolic compound and an unsaturated cycloacetal, the composition being curable with an active energy rays, the improvement residing in the use of an onium salt. The cured material has no appreciable odor of acrolein and is stable in storage.
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| 申请公布号 |
US4640937(A) |
申请公布日期 |
1987.02.03 |
| 申请号 |
US19850757523 |
申请日期 |
1985.07.19 |
| 申请人 |
SHOWA HIGHPOLYMER CO. LTD. |
发明人 |
HANYUDA, TOSHIAKI |
| 分类号 |
C08L25/00;C08F2/46;C08G61/00;C08G61/12;C08K5/05;C08L7/00;C08L21/00;C08L25/18;C08L61/00;C08L61/04;C08L61/06;(IPC1-7):C08F2/46 |
主分类号 |
C08L25/00 |
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