发明名称 DEVELOPING SOLUTION COMPOSITION AND DEVELOPING METHOD FOR PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PURPOSE:To process both of negative type and positive type photosensitive lithographic printing plates by using a developing soln. compsn. into which an alkali agent, specific org. solvent, anionic surface active agent and sulfite are incorporated and which is adjusted to a specific pH range. CONSTITUTION:The following materials are incorporated into the developing soln. compsn. to prepare and compsn.: A): the alkali agent, for example, sodium silicate, B): the org. solvent having <=10wt% solubility with water at 20 deg.C, for example, monophenyl ether of ethylene glycol, benzyl alcohol or benzyl ether of ethylene glycol, C): the anionic surface active agent and D): the sulfite are incorporated therein and the pH of the compsn. is adjusted to a 11.5-13.3 range. Since such developing soln. compsn. is used in the above-mentioned pH range, both of the negative type photosensitive lithographic printing plate and the positive type photosensitive lithographic printing plate are adequately processed.
申请公布号 JPS6225761(A) 申请公布日期 1987.02.03
申请号 JP19850166250 申请日期 1985.07.26
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 NOGAMI AKIRA;UEHARA MASABUMI;KIYONO MINORU;NAKANO MIEJI
分类号 G03F7/30;G03F7/00;G03F7/32 主分类号 G03F7/30
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