发明名称 PHOTOGRAPHIC MATERIAL
摘要 PURPOSE:To enhance a photographic material in nail scratch resistance even if it is immersed in water, and to prevent it from cracking even if it is bent or folded, by irradiating a protective coat layer composed of a specified composition containing 4 kinds of components with light including the UV region to harden them. CONSTITUTION:The protective coat layer of the photographic material is formed by irradiating a composition containing at least one selected from the following 3 groups: (group A) polyglycidyl ethers of aromatic polyols; (group B) alicyclic polyepoxide; and (group C) polyglycidyl esters of polybasic acids, polyglycidyl ethers of polyols, polyglycidyl ethers of polyoxyalkylene glycols, and urethane epoxy compounds; and (group D) a cationic polymerization initiator with the light including the UV region. The epoxy compound of (A) is mixed into the composition especially for enhancing water resistance, and it is necessary to add it in an amount of at least 10wt% of the total weight, (B) is added, preferably, in an amount of 20-70wt%, and (C) is added, preferably, in an amount of 5-12wt%.
申请公布号 JPS6224256(A) 申请公布日期 1987.02.02
申请号 JP19850164758 申请日期 1985.07.25
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 SHIBUE TOSHIAKI;NAKATATE TAKANORI
分类号 G03C11/00;G03C11/08 主分类号 G03C11/00
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