| 摘要 |
PURPOSE:To wash the inside of a reaction vessel after the formation of an accumulated film smoothly and with high efficiency by providing a collection tank wherein a reaction residue incorporated in the inside of the reaction vessel is collected to the route of an exhaust system and providing separately an exhaust system recovering the reaction residue collected therein. CONSTITUTION:A cylindrical electrically-conductive base body 6 is introduced into the inside of a reaction vessel 2 and mounted on a bearer 5 of the base body in allowing both the axial cores to coincide nearly with each other and the gates 23, 25 are closed. Then after performing the exhaust through an exhaust system A to decompress the inside of the reaction vessel 2 up to about 10<-2>-10<-6>Torr degree of vacuum, a gas for forming an accumulated film is introduced through the gas introduction pipes 7. Simultaneously high frequency electric power is fed to the vessel 2 to cause the glow discharge and the accumulated film is formed while allowing the base body 6 to remain stationary. In case of washing the reaction vessel 2 after the formation of the accumulated film, high-pressure inert gas is introduced through the gas introduction pipes 10 to transfer the reaction residue incorporated in the inside of the vessel 2 to the inside of a powdery material trap 14 provided to the exhaust system A, and therewith the nonaccumulated radical is solidified and collected in the inside of the trap 14 and recovered with a recovery means 17 provided to a subexhaust system B. |
