| 摘要 |
PURPOSE:To measure the concn. of the cuprous ions in an etching soln. contg. the cuprous ions with high accuracy by immersing a germanium electrode and reference electrode into the etching soln. and measuring the potential of the germanium. CONSTITUTION:The cuprous ions are formed and the dissolution rate of copper decreases when the copper is dissolved by using the acidic etching soln. of a hydrochloric acid contg. cupric chloride. The germanium electrode and reference electrode (for example, silver chloride electrode, calomel electrode, etc.) is immersed into such etching soln. and the potential of the germanium is measured on the basis of the reference electrode. The potential of the germanium and the concn. of the cuprous ions have correlativity. Since the potential of the germanium is measured, the concn. of the cuprous ions in the etching soln. is easily and exactly measured and a printed circuit, etc. are exactly produced. |
