发明名称 POSITIONING METHOD FOR SUBSTRATE WHERE PATTERN IS TO BE FORMED
摘要 PURPOSE:To perform accurate positioning on the basis of a positioning mark which is viewed through a cut part formed by cutting part of a circle and a partial circle part by shaping an alignment key in a partial concentric circle consisting of the cut part and partial circle part. CONSTITUTION:A glaze layer 2 is formed on a pattern formation substrate 1 by screen printing and a circular glaze 3 for alignment is formed simultaneously with the formation of the layer 2. This glaze 3 is formed nearby the end part of two corresponding sides in the extension direction of the layer 2. The alignment key 5 corresponding to the position of the glaze 3 is formed at the end part of two sides of a photomask made of transparent glass. Further, the desired pattern of the substrate 1 is formed in the photomask 4. The key 5 consists of the partial circle part 5a and cut part 5b and the circular glaze 3 is nearly as large as the key 5; when the both are put one over the other, the glaze 3 can be seen through the cut part 5b, so that the glaze 3 and key 5 are positioned accurately.
申请公布号 JPS6219856(A) 申请公布日期 1987.01.28
申请号 JP19850159444 申请日期 1985.07.18
申请人 ROHM CO LTD 发明人 NAGAHATA TAKANARI
分类号 B41J2/335;G03F1/00;G03F1/38;G03F1/42;G03F9/00;H01L21/027 主分类号 B41J2/335
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