发明名称 TREATMENT OF PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To sufficiently render nonimage areas oleophobic without reducing olephilicness of the image areas and without producing a large amount of waste water by processing an optional combination of both of negative and positive type PS plates with the same automatic developing machine. CONSTITUTION:A prescribed amount of developing solution for the negative type and that for the positive type are fed, respectively, into a developing solution storage tank 6 (for the positive type) corresponding to the development processing bath 1, and a prescribed amount of a development replenishing solution is fed into a development replenishing solution storage tank (for the positive type). Both negative and positive developing solutions are selected with a control device 18 in accordance with the information on the types to be processed, and both developing solutions are fed into the bath 1 with developing solution feeding pumps 8, 11 and a development replenishing solution pump 8' by the instruction of the controller 18. A prescribed composition and a prescribed amount of processing solution for enhancing oleophobicness is fed into its storage tank 15, and this solution is fed with its feed ump 14 to a processing bath 13, thus permitting an optional combination of both type PS plates to be processed without producing waste rinse water from the image processing section, and the nonimage areas to be made sufficiently oleophobic.
申请公布号 JPS6219858(A) 申请公布日期 1987.01.28
申请号 JP19850160944 申请日期 1985.07.18
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 NAKAI HIDEYUKI;UEHARA MASABUMI;KIYONO MINORU;KOMENO ATSUO
分类号 G03F7/30 主分类号 G03F7/30
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