| 摘要 |
PURPOSE:To improve the linearity of a pattern edge and the sharpness of a corner by increasing the emitting amount of a high energy beam at small emitting density portion when forming a drawing pattern by scanning the beam. CONSTITUTION:A rectangular pattern is formed by an electron beam 11 deflected in an X-direction and scanned in a Y-direction. At this time double drawing dots 12 are emitted to the intermediate pitch of the scanning pitch of Y-direction scan in first and forth rows of the both ends. Dots 13 are superposed and emitted at the normal pitch only in the first and fourth rows of the both ends. Further, dots 14 are superposed and emitted at the points of the corners. Thus, a reversed portion is hardly formed in the desired profile line at both deflecting ends, and when a mask 20 having a rectangular defect is formed, the line parallel to the Y-axis becomes substantially linear line 21, and the corner 22 does not almost have a roundness. |
