发明名称 PRODUCTION OF BISMUTH-CONTAINING OXIDE SINGLE CRYSTAL
摘要 PURPOSE:To obtain the titled extremely high-purity crystal by introducing the vapor of alkylated bismuth or metallic bismuth into a heated reaction vessel along with the vapor of an org. compd. of other metallic ions constituting the crystal and allowing the vapors to react with gaseous oxygen. CONSTITUTION:An Al2O3 crucible 3 contg. metallic Bi 2 is placed in a quartz tube 1 and a substrate 5 is placed on a substrate carrier 4. Gaseous Ar is introduced from a gaseous Ar inlet 6 to form an inert atmosphere in the quartz tube 1 and the metallic Bi 2 and the substrate 5 are heated by an electric furnace 7. When the temp. in the furnace is made constant, gaseous O2 and the raw gas are respectively introduced from a gaseous O2 inlet 8 and a raw gas inlet 9 and crystal growth is started. A Bi-contg. oxide single crystal is obtained on the substrate. By this method, the mixing of impurities from the crucible is completely eliminated and extremely high-purity raw gas can be easily utilized. Accordingly, the titled single crystal such as Bi12SiO20 and Bi12GeO20 having excellent electro-optical and magneto-optical characteristics and which are used for an image processing optical device, an optical arithmetic element, a magneto-optical element, etc., can be obtained.
申请公布号 JPS6217099(A) 申请公布日期 1987.01.26
申请号 JP19850155232 申请日期 1985.07.16
申请人 KOKUSAI DENSHIN DENWA CO LTD <KDD> 发明人 MIMURA HIDENORI;NAGAO YASUYUKI
分类号 C30B29/22;C23C16/40;C30B25/00;C30B25/02;C30B29/28 主分类号 C30B29/22
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