METHOD FOR FORMING PATTERNED THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a new method for forming a patterned thin film by which a patterned thin film in a nanometer scale can be easily formed at a low cost with high controlling property. SOLUTION: In the method for forming a patterned thin film to form a patterned thin film on an insulative substrate in a precursor solution containing a film forming substance, an electrification pattern (3) is first formed on an insulative substrate (2). Then the insulative substrate (2) is immersed in a precursor solution to precipitate the film forming substance on the electrification pattern (3) formed on the substrate (2).