Apparatus for continuous processing in directions of x- and y- Co-Ordinates.

摘要

An apparatus for continuous processing of a work piece, such as, IC- or LSI-chip or so on, in the directions of x- and y- co-ordinates, which comprises a pair of heat ray sources (47,48) arranged on a rotatable heat ray source assembly for irradiating pairs of parallel processing lines, by focussing the heat ray onto each of said processing lines in a definite line focus having a form of a segment of a line; a cylinder/piston arrangement (17) for effecting vertical positioning of said pair of heat ray sources for adjusting the focussing of heat ray onto said processing line; a distance adjusting means (25, 39) for adjusting the distance between said pair of parallel line focuses by effecting a parallel relative shifting of said pair of heat ray sources; a masking element provided for each heat ray source and having a pair of shield members for limiting the width of the heat ray beam discharging from the heat ray source to determine the length of line focus for each processing in x- or y- direction; and a masking element actuating means provided for each of said pair of heat ray sources and comprising a pair of cylinder/piston units for effecting simultaneous relative shifting of said pair of shield members to limit the width of the heat ray beam and thus to define the length of the line focus.