| 摘要 |
PURPOSE:To prevent the erroneous detection of a pattern, by applying XY scanning to a surface to be inspected by S-polarized beam while allowing the P-polarized component of reflected beam to be incident to a photoelectric converter element and judging whether foreign matter is present on the surface to be inspected on the basis of the output signal of the photoelectric converter element. CONSTITUTION:A wafer 12 is subjected to XY scanning by S-polarized beams 16, 18 and the P-polarized components of the reflected beams of S-polarized beams 16, 18 from the wafer 12 are incident to photomultipliers 44, 46. The presence of the foreign matter on the wafer 12 is judged on the basis of the output signals of the photomultipliers 44, 46. The patterns of the wafer 12 are largely present in the orthogonally crossing axial directions based on an orifice. Therefore, if the main-scanning and sub-scanning directions of XY scanning are selected so that said principal patterns and irradiation beams take no undesirable angular relation, the erroneous detection of patterns is hardly generated. |
