| 摘要 |
PURPOSE:To make it possible to rapidly and easily set an optimum inspection condition, by repeating the inspection of foreign matter to the same article to be inspected plural times while changing a condition and storing the inspection data of each time in a memory means. CONSTITUTION:A foreign matter inspection apparatus for a wafer is constituted so that a Z-stage 20 is provided on an X-stage 10 and a wafer 30 as an article to be inspected is mounted thereof to be rotated by a rotary stage 22. Foreign matter 30 is irradiated with S-polarized laser beams 36, 38 and the reflected beams reach a 45 deg. prism 60 through the optical system common to a detection system 50 detecting the foreign matter and a microscope 52 for the visual observation of the wafer, that is, an objective lens 54, a half mirror 56 and a prism 58. The inspection of the foreign matter to the same article to be inspected is repeated plural times while a condition changes and the resulting data of the inspection of the foreign matter at each time is stored in a memory means and the operation mode thereof is preliminarily imparted to the foreign-matter inspection apparatus to automatically obtain the inspection data of the foreign matter under various inspection conditions and an optimum condition is easily judged from the resulting data. |
