| 摘要 |
PURPOSE:To improve adhesion between a surface modifying layer and an electrostatic charge generating layer and to enhance resistances to mechanical damage and printing by forming between the surface modifying layer and the charge generating layer an interlayer containing an amount of N or the total amount of N and 0 smaller than that of the surface modifying layer and increasing from the side of the charge generating layer toward the side of the surface modifying layer. CONSTITUTION:A charge transfer layer 42 made of amorphous silicon hydride and/or fluoride, the charge generating layer 43 made of amorphous silicon hydride and/or fluoride, the interlayer 46 made of amorphous silicon hydride and/or fluoride containing at least N of N and 0, and the surface modifying layer 45 made of amorphous silicon hydride and/or fluoride containing at least N and 0 in an amount of at least >=50atom.% are laminated in succession. The content of N or the total content of N and 0 of the interlayer 46 is smaller than that of the surface modifying layer 45, and continuously increases from the side of the charge generating layer 43 toward the side of the surface modifying layer 45. |
