发明名称 |
Reflector for generating a neutral beam and substrate processing apparatus including the same |
摘要 |
Example embodiments of the present invention provide a reflector for generating a neutral beam and a substrate processing apparatus including the same. The reflector may include at least one reflecting plate including a reflecting layer onto which an ion beam collides and a supporting layer. The reflecting layer may reflect and convert the ion beam into a neutral beam, and the supporting layer may reduce thermal deformation of the reflecting layer.
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申请公布号 |
US2006219887(A1) |
申请公布日期 |
2006.10.05 |
申请号 |
US20060341558 |
申请日期 |
2006.01.30 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HWANG SUNG-WOOK;SHIN CHUL-HO |
分类号 |
H05H3/02 |
主分类号 |
H05H3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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