发明名称 Reflector for generating a neutral beam and substrate processing apparatus including the same
摘要 Example embodiments of the present invention provide a reflector for generating a neutral beam and a substrate processing apparatus including the same. The reflector may include at least one reflecting plate including a reflecting layer onto which an ion beam collides and a supporting layer. The reflecting layer may reflect and convert the ion beam into a neutral beam, and the supporting layer may reduce thermal deformation of the reflecting layer.
申请公布号 US2006219887(A1) 申请公布日期 2006.10.05
申请号 US20060341558 申请日期 2006.01.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HWANG SUNG-WOOK;SHIN CHUL-HO
分类号 H05H3/02 主分类号 H05H3/02
代理机构 代理人
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