发明名称 PROCESS FOR THE RADIOACTIVE DECONTAMINATION OF SURFACES
摘要 1. A process for the radioactive decontamination of surfaces polluted by the deposit of contaminating agents, in particular in the form of dust, according to which the surfaces, before being exposed to the contaminating agents, are provided with a film forming material which after drying forms an adhesive coating, and after contamination the contaminated surfaces are subjected to washing by a solution in which said film forming material exhibits good solubility so as to dissolve the film forming coating sufficiently so that it takes the contaminating agents with it when being eliminated ; said process being characterized in that the adhesive film forming coating formed on the surfaces is, on the one hand, soluble in water or in any aqueous solution having a pH between approximately 6 and 8 and, on the other hand, exhibits good solubility in an aqueous solution whose pH is outside the range of above-mentioned values, and in that said aqueous solution is used as the washing solution for contaminated surfaces.
申请公布号 DE3368143(D1) 申请公布日期 1987.01.15
申请号 DE19833368143 申请日期 1983.02.23
申请人 SOCIETE LORRAINE DE PEINTURES ET VERNIS (SLPV) S.A. 发明人 HENRION, LUCIEN
分类号 G21F9/28;G21F9/00;(IPC1-7):G21F9/00 主分类号 G21F9/28
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