发明名称 DISPOSITIF POUR LE DEPOT ELECTROLYTIQUE D'UN MATERIAU CONDUCTEUR SUR DES PLAQUES DE CIRCUITS INTEGRES.
摘要 The arrangement which is designed to be put into an electrolytic vat comprises a framework arranged to receive several pairs of substrates placed back-to-back, mechanical systems fixed to the framework for positioning and maintaining the substrates in place on the framework and an electrical system likewise fixed to the framework and having contact points to enable coupling the conductive layers of the integrated circuits onto which the conductive material is to be deposited to the feed voltage source of the vat. Preferably the mechanical systems are designed to maintain the two substrates of each pair in contact one against the other.
申请公布号 CH659259(A5) 申请公布日期 1987.01.15
申请号 CH19830006430 申请日期 1983.12.01
申请人 EM MICROELECTRONIC-MARIN S.A. 发明人 JEANNOT, MICHEL;SALVALAI, ITALO
分类号 H01L21/60;C25D17/00;H01L21/288;H01L21/673;(IPC1-7):C25D19/00 主分类号 H01L21/60
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