MEMBER HAVING SILICON NITRIDE FILM CONTAINING OXYGEN ATOM ON SURFACE BY TREATMENT AND TREATMENT OF SURFACE,申请号JP19850144638-传众专利搜索

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发明名称	MEMBER HAVING SILICON NITRIDE FILM CONTAINING OXYGEN ATOM ON SURFACE BY TREATMENT AND TREATMENT OF SURFACE
摘要
申请公布号	JPS627864(A)	申请公布日期	1987.01.14
申请号	JP19850144638	申请日期	1985.07.03
申请人	TOSHIBA CORP	发明人	YAMAZAKI MUTSUKI
分类号	C23C16/34	主分类号	C23C16/34
代理机构		代理人
主权项
地址

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