发明名称 ACCUMULATED FILM FORMATION DEVICE BY OPTICAL CVD METHOD
摘要 PURPOSE:To obtain the titled device capable of forming an accumulated film having the excellent characteristics stably efficiently and continuously by providing respectively a light- transmitting plate and a substrate to the notched parts of the upper and lower walls, constituting the inside of a reaction chamber of a smooth surface free from a projected material and providing a simply designed exchange means for the light-transmitting plate. CONSTITUTION:A trapezoidal space B is formed by notching101 an upper wall of the following reaction vessel 1 in a prescribed size which are provided with a reaction chamber A formed by surrounding and closing it with the upper and lower walls and the peripheral walls. A light-transmitting plate 2 is a reversing trapezoid having same size as the space B and tightly stuck in one body on the upper wall of the vessel 1 freely attachably and detachably by fitting a projected part 201 thereof into a fitting recess 102 of the notched part. The following mounting dish 103 is provided to a bottom wall which is recessed and formed in both-end positions of the energy luminous flux 803 generated in a high-energy light gemerating means 8, converged and irradiated downward and both the surface of a substrate 3 and the surface of the lower wall are made to a plane of one body in case of mounting the substrate 3 thereon. A gaseous raw material is fed to the chamber A through a feed pipe 4 and discharged through an exhaust pipe 6. In a period of the exchange of the plate 2, after ascending a cylinder 10 to push up the plate 2 and substituting it with a new plate 2, the new plate 2 is fitted and stuck by descending the cylinder.
申请公布号 JPS627865(A) 申请公布日期 1987.01.14
申请号 JP19850144594 申请日期 1985.07.03
申请人 CANON INC 发明人 ECHIZEN YUTAKA
分类号 C23C16/48;G03G5/08 主分类号 C23C16/48
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