| 摘要 |
PURPOSE:To allow the control of the exposure position of the charged beam with a simple configuration and higher accuracy by a method wherein an alignment mark is detected with a laser beam, and the shifting information for the stage and the positioning information for the charged beam are obtained on the basis of the detected results. CONSTITUTION:With laser beams LAX and LAY for detecting an alignment mark, a stage 1 is shifted by a stage position control device 32 to a place where it is possible to scan X-axis and Y-axis alignment marks 4Xb and 4Yb accompanied with a chip 3b adjacent to a chip 3a to be drawn first. Alignment detection signals S2X and S2Y generated with scanning are received by the exposure control device 31, the stage position control device 32 stops the stage 1, receiving the output signal, and the position is accurately detected by a stage position reading device 33. When based upon the stored information, the exposure control device 31 calculates the position of the chip 3a for starting the exposure and feeds the result to the charged beam position control device 7, the control device 7 deflectively controls the charged beam 5 through an electron lens 6. |
