发明名称 |
ZINC OXIDE FILMS DEPOSITION METHOD |
摘要 |
FIELD: application of thin-film coatings, namely application of transparent low-emission coatings in vacuum by reactive magnetron spraying. ^ SUBSTANCE: method is realized due to magnetron spraying while supplying to target pulse bipolar voltage. Invention provides improved uniformity of parameters of film of oxide of zinc doped with aluminum at temperature of substrate no more than 150°C. ^ EFFECT: enhanced uniformity of film parameters. ^ 1 dwg
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申请公布号 |
RU2316613(C1) |
申请公布日期 |
2008.02.10 |
申请号 |
RU20060113291 |
申请日期 |
2006.04.19 |
申请人 |
INSTITUT SIL'NOTOCHNOJ EHLEKTRONIKI SO RAN |
发明人 |
ZAKHAROV ALEKSANDR NIKOLAEVICH;PODKOVYROV VIKTOR GEORGIEVICH;RABOTKIN SERGEJ VIKTOROVICH;SOCHUGOV NIKOLAJ SEMENOVICH |
分类号 |
C23C14/35 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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