| 摘要 |
PURPOSE:To enhance the gamma value of a positive type photoresist by using for this resist a combination of a quinone diazide compd. and a novolak resin synthesized from one of specified phenols in the presence of an org. acid salt of a bivalent metal higher in electric positivity than H. CONSTITUTION:One of compds. or a mixture of compds. represented by the formula, R being H or 1-4C alkyl, such as phenol, cresoln, or their isomer, is used for the material of a novolak resin. An average C number of the substituent of said compd. per one phenol nucleus is 0.5-1.5, and a content of said compd. having the substituent at the o- or p-position with respect to the hydroxide group is <=50mol%. For example, a m- and p-cresol mixture in the following range is used: m-cresol/p-cresol <=1. As a catalyst, the org. acid salt of a bivalent metal higher in electric positivity than H2, such as Mn or Zn, is used, and the phenol is partially additionally condensed with formaldehyde in a pH of 4-7, and further, addition condensation reaction is executed in the presence of an acid catalyst. The gamma value is controlled by adjusting the reaction times of the first and second stages. |
